Materials for microlithography :

Materials for microlithography : radiation-sensitive polymers / L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984. - Washington, D.C. : The Society, c1984. - viii, 494 p. : ill. ; 24 cm. - ACS symposium series, 266 0097-6156 ; .

Includes bibliographies and indexes.

0841208719

84021744


Polymers--Congresses.
Photoresists--Congresses.
Microlithography--Materials--Congresses.
Microelectronics--Materials--Congresses.

TK7871.15.P6 / M37 1984

621.381/73