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Chemical vapor deposition :

Chemical vapor deposition : principles and applications / edited by Michael L. Hitchman and Klavs F. Jensen. - London ; San Diego : Academic Press, c1993. - v, 677 p. : ill. ; 24 cm.

Includes bibliographical references and index.

ISBN: 0123496705

LCCN: 93125773

Subjects--Topical Terms:
Chemical vapor deposition.--Manufactures

LC Class. No.: TS695 / .C54 1993

Dewey Class. No.: 620/.44

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