| 000 | 00963nam a2200289 4500 | ||
|---|---|---|---|
| 001 | 1951437 | ||
| 005 | 20150429123806.0 | ||
| 007 | 000 | ||
| 008 | 000 | ||
| 010 | _a 87037419 | ||
| 020 | _a0124693709 (alk. paper) | ||
| 040 |
_aUOEL _cDLC _dDLC |
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| 050 | 0 | 0 |
_aTA2020 _b.P5 1989 |
| 082 | 0 | 0 |
_a621.044 _219 |
| 245 | 0 | 0 |
_aPlasma etching : _ban introduction / _cedited by Dennis M. Manos, Daniel L. Flamm. |
| 260 |
_aBoston : _bAcademic Press, _cc1989. |
||
| 300 |
_axii, 476 p. : _bill. ; _c24 cm. |
||
| 440 | 0 | _aPlasma -- materials interactions | |
| 504 | _aIncludes bibliographical references and index. | ||
| 650 | 0 | _aPlasma etching. | |
| 700 | 1 | _aManos, Dennis M. | |
| 700 | 1 | _aFlamm, Daniel L. | |
| 856 | 4 | 2 |
_3Publisher description _uhttp://www.loc.gov/catdir/description/els032/87037419.html |
| 856 | 4 | 1 |
_3Table of contents _uhttp://www.loc.gov/catdir/toc/els031/87037419.html |
| 906 |
_a7 _bcbc _corignew _d1 _eocip _f19 _gy-gencatlg |
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| 942 |
_2lcc _cLL |
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| 999 |
_c6197 _d6197 |
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