Chemical vapor deposition : principles and applications / edited by Michael L. Hitchman and Klavs F. Jensen.
Material type:
TextPublication details: London ; San Diego : Academic Press, c1993.Description: v, 677 p. : ill. ; 24 cmISBN: - 0123496705
- 620/.44 20
- TS695 .C54 1993
| Item type | Current library | Call number | Copy number | Status | Date due | Barcode | Item holds | |
|---|---|---|---|---|---|---|---|---|
Loan - Normal on open shelf
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UOE Main Library Open shelf | TS695 .C54 1993 (Browse shelf(Opens below)) | 10055325 | Available | 10055325 |
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| TS517.2 O68 1994 Physics of thin films | TS653.5 .E58 1989 Environmental aspects of the metal finishing industry : | TS692.Z5 G43 1988 Zinc plating | TS695 .C54 1993 Chemical vapor deposition : | TS801 .W66 Wood technology, chemical aspects : | TS805.P34 .F67 Forest products : | TS820 .B76 Lumber |
Includes bibliographical references and index.
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