Chemical vapor deposition : principles and applications / edited by Michael L. Hitchman and Klavs F. Jensen.

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Material type: Text

TextPublication details: London ; San Diego : Academic Press, c1993.Description: v, 677 p. : ill. ; 24 cmISBN:

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Holdings
Item type	Current library	Call number	Copy number	Status	Date due	Barcode	Item holds
Loan - Normal on open shelf	UOE Main Library Open shelf	TS695 .C54 1993 (Browse shelf(Opens below))	10055325	Available		10055325

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Includes bibliographical references and index.

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