Materials for microlithography : radiation-sensitive polymers / L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984.
Material type:
TextSeries: ACS symposium series ; 266Publication details: Washington, D.C. : The Society, c1984.Description: viii, 494 p. : ill. ; 24 cmISBN: - 0841208719
- 621.381/73 19
- TK7871.15.P6 M37 1984
| Item type | Current library | Call number | Copy number | Status | Date due | Barcode | Item holds | |
|---|---|---|---|---|---|---|---|---|
Loan - Normal on open shelf
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UOE Main Library Open shelf | TK7871.15.P6 M37 1984 (Browse shelf(Opens below)) | 10043689 | Available | 10043689 | |||
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Loan - Normal on open shelf
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UOE Main Library Open shelf | TK7871.15.P6 M37 1984 (Browse shelf(Opens below)) | 10043690 | Available | 10043690 | |||
|
Loan - Normal on open shelf
|
UOE Main Library Open shelf | TK7871.15.P6 M37 1984 (Browse shelf(Opens below)) | 10043688 | Available | 10043688 | |||
|
Loan - Normal on open shelf
|
UOE Main Library Open shelf | TK7871.15.P6 M37 1984 (Browse shelf(Opens below)) | 10043691 | Available | 10043691 |
Total holds: 0
Includes bibliographies and indexes.
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